Dielectric properties of Ba0.5Sr0.5TiO3/SiN bilayered thin films grown on Pt-coated sapphire substrates

被引:24
|
作者
Xiong, Niandeng [1 ]
Jiang, Shuwen [1 ]
Li, Yanrong [1 ]
Tan, Lefan [1 ]
Li, Ruguan [1 ]
机构
[1] Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R China
基金
中国国家自然科学基金;
关键词
barium compounds; buffer layers; dielectric losses; dielectric thin films; platinum; silicon compounds; strontium compounds; thin film capacitors;
D O I
10.1063/1.3049127
中图分类号
O59 [应用物理学];
学科分类号
摘要
The Ba0.5Sr0.5TiO3(BST)/SiN bilayered thin films with a SiN layer serving as a buffer layer between the top electrode and the BST layer have been prepared onto Pt-coated c-plane sapphire substrates. The dielectric measurements show that the loss tangent has been significantly lowered. The dielectric properties of the BST/SiN bilayered thin films are strongly dependent on the SiN thickness. The BST/SiN bilayered thin films at a SiN/BST thickness ratio of 0.2 give the largest figure of merit of 50.1. The thickness effect was discussed as well with a series connection model of multilayered capacitors, and the favorable simulation was obtained.
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页数:3
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