Rf power absorption and antenna impedance in an m=0 helicon plasma source

被引：2

作者：

Shamrai, KP ^{[1
]}

Pavlenko, VP ^{[1
]}

机构：

[1] UNIV UPPSALA,DEPT TECHNOL,S-75121 UPPSALA,SWEDEN

来源：

PHYSICA SCRIPTA | 1997年 / 55卷 / 05期

关键词：

D O I：

10.1088/0031-8949/55/5/014

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The excitation of waves and wave power release are considered in a helicon plasma source driven by an axially-symmetric m = 0 antenna. The volume power input via helicon waves is shown to be enhanced and more peaked near the plasma axis as compared with the case of a source driven by an axially anti-symmetric antenna. The resistance of the antenna loaded by the wave excitation is found to minimize near antiresonance states which provides the condition for a helicon discharge stability.

引用

页码：612 / 616

页数：5

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