Electrical Characterization and Microstructures of La-doped Bi4Ti3O12 thin films

被引:0
作者
Mei, X. A. [1 ]
Chen, M. [1 ]
Liu, R. F. [1 ]
Sun, Y. H. [1 ]
Liu, J. [1 ]
机构
[1] Hunan Inst Sci & Technol, Sch Phys, Yueyang 414000, Peoples R China
来源
CHINESE CERAMICS COMMUNICATIONS II | 2012年 / 412卷
关键词
Ferroelectric; Dielectric; Films; BISMUTH TITANATE;
D O I
10.4028/www.scientific.net/AMR.412.318
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
La-doped bismuth titanate (Bi4-xLaxTi3O12: BLT) and pure Bi4Ti3O12 (BIT) thin films with random orientation were fabricated on Pt/Ti/SiO2/Si substrates by rf magnetron sputtering technique. These samples had polycrystalline Bi-layered perovskite structure without preferred orientation, and consisted of well developed rod-like grains with random orientation. La-doping into BIT caused a large shift of the Curie temperature (T-C) from 675 degrees C to lower temperature and a improvement in dielectric property. The experimental results indicated that La doping into BIT also result in a remarkable improvement in ferroelectric property. The P-r and the E-c values of the BLT film with x=0.75 were 20 mu C/cm(2) and 82kV/cm, respectively.
引用
收藏
页码:318 / 321
页数:4
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