Influence of oxygen partial pressure on the metastable copper oxide thin films

被引：1

作者：

Gecici, Birol ^{[1
]}

Korkmaz, Sadan ^{[1
]}

Ozen, Soner ^{[1
]}

Senay, Volkan ^{[2
]}

Pat, Suat ^{[1
]}

机构：

[1] Eskisehir Osmangazi Univ, Dept Phys, Meselik Campus, TR-26480 Eskisehir, Turkey

[2] Bayburt Univ, Primary Sci Educ Dept, TR-69000 Bayburt, Turkey

来源：

MODERN PHYSICS LETTERS B | 2016年 / 30卷 / 35期

关键词：

Metastable copper oxide thin film; reactive RF sputter; XRD; AFM; GROWTH; PARAMELACONITE; NANOPARTICLES; CU2O;

D O I：

10.1142/S0217984915300124

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Paramelaconite (Cu4O3) is a metastable copper oxide. Metastable copper oxide thin films were deposited on glass substrates by reactive RF magnetron sputtering in argon (Ar) and oxygen (O-2) gas mixture atmospheres. Ar/O-2 gas ratios in the sputtering ambient were chosen as 1/1 and 1/9. The surface and optical properties were determined by X-ray diffractometer (XRD), atomic force microscope (AFM) and UV-Vis spectrophotometer. The XRD patterns of the samples exhibited single strong diffraction peaks at 35.39 degrees and 35.49 degrees, corresponding to the (202) peak of Cu4O3. The mean thickness values were measured as 100 nm and 80 nm for the films deposited at 1/1 and 1/9 Ar/O-2 gas ratios, respectively. The samples showed low transmittance and high absorbance in the high frequency region.

引用

页数：7

共 21 条

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