Multiple surface phase shifting interferometry

被引:39
作者
Deck, LL [1 ]
机构
[1] Zygo Corp, Middlefield, CT 06455 USA
来源
OPTICAL MANUFACTURING AND TESTING IV | 2001年 / 4451卷
关键词
interferometry; phase shifting; metrology; homogeneity;
D O I
10.1117/12.453640
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
I show how phase shifting interferometry can be extended to account for multiple interference effects using a Fourier based analysis technique combined with wavelength tuning and a particular four-surface interferometer geometry. The technique is demonstrated by simultaneously measuring both surface profiles, the optical thickness variation and index homogeneity of a parallel plate. In addition, unlike traditional phase shifting techniques, the linear component of the homogeneity can be measured with high precision. It is shown that a significant linear component exists in a commercially supplied flat.
引用
收藏
页码:424 / 431
页数:8
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