Superdiffusion in Si crystal lattice irradiated by soft X-rays

We considered the reasons Of superdiffusivity and measured profiles of boron and phosphorus in crystalline silicon kit, room temperature. The superdiffusivity or ultrafast diffusion of metastable vacancies at, room temperature in Si crystal irradiated by soft X-rays was obtained experimentally. In this work, we presented experimentally obtained diffusion coefficients of singly and doubly negatively charged long-lived excited vacancies. These high concentration charged metastable vacancies (about 10(13) cm(-3)) at room temperature can very fast diffuse changing electrical conductivity and the Hall mobility of carriers. We measured the superdiffusivity of negatively charged vacancies, generated by the Anger effect. in the regions of the sample, which were not affected by X-rays. In this paper, we presented the obtained superdiffusion profiles of boron kind phosphorus in crystalline Silicon measured with secondary-ion mass spectrometer.