A novel three-dimensional dual control-gate with surrounding floating-gate (DC-SF) NAND flash cell

被引:9
|
作者
Aritome, Seiichi [1 ]
Whang, SungJin [1 ]
Lee, KiHong [1 ]
Shin, DaeGyu [1 ]
Kim, BeomYong [1 ]
Kim, MinSoo [1 ]
Bin, JinHo [1 ]
Han, JiHye [1 ]
Kim, SungJun [1 ]
Lee, BoMi [1 ]
Jung, YoungKyun [1 ]
Cho, SungYoon [1 ]
Shin, ChangHee [1 ]
Yoo, HyunSeung [1 ]
Choi, SangMoo [1 ]
Hong, Kwon [1 ]
Park, SungKi [1 ]
Hong, SungJoo [1 ]
机构
[1] SK Hynix, R&D Div, Inchon 467701, Gyeonggi Do, South Korea
关键词
3D; Floating gate; NAND; Flash memory; ULTRA-HIGH DENSITY;
D O I
10.1016/j.sse.2012.07.005
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A novel three-dimensional (3D) Dual Control gate with Surrounding Floating gate (DC-SF) NAND flash cell has been successfully developed. The DC-SF cell consists of a surrounding floating gate with stacked dual control gates. With this structure, high coupling ratio, low voltage cell operation, and wide P/E window (9.2 V) can be obtained. Moreover, negligible FG-FG coupling interference (12 mV/V) is achieved due to the control-gate shield effect. As a result, DC-SF NAND flash cell can overcome the problems of SONOS-based 3D NAND flash. It is proposed that 3D DC-SF NAND flash cell is the most promising candidate for 1 Tb and beyond, with stacked multi bit FG cell (2-4 bits/cell). (C) 2012 Elsevier Ltd. All rights reserved.
引用
收藏
页码:166 / 171
页数:6
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