Monolithic Ge-on-Si lasers for large-scale electronic-photonic integration

被引:102
作者
Liu, Jifeng [1 ]
Kimerling, Lionel C. [2 ]
Michel, Jurgen [2 ]
机构
[1] Dartmouth Coll, Thayer Sch Engn, Hanover, NH 03755 USA
[2] MIT, Dept Mat Sci & Engn, Microphoton Ctr, Cambridge, MA 02139 USA
关键词
DOPED N-TYPE; BAND-GAP SHRINKAGE; OPTICAL-PROPERTIES; INFRARED-ABSORPTION; EPITAXIAL-FILMS; GERMANIUM; GAIN; EMISSION; ELECTROLUMINESCENCE; RECOMBINATION;
D O I
10.1088/0268-1242/27/9/094006
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A silicon-based monolithic laser source has long been envisioned as a key enabling component for large-scale electronic-photonic integration in future generations of high-performance computation and communication systems. In this paper we present a comprehensive review on the development of monolithic Ge-on-Si lasers for this application. Starting with a historical review of light emission from the direct gap transition of Ge dating back to the 1960s, we focus on the rapid progress in band-engineered Ge-on-Si lasers in the past five years after a nearly 30-year gap in this research field. Ge has become an interesting candidate for active devices in Si photonics in the past decade due to its pseudo-direct gap behavior and compatibility with Si complementary metal oxide semiconductor (CMOS) processing. In 2007, we proposed combing tensile strain with n-type doping to compensate the energy difference between the direct and indirect band gap of Ge, thereby achieving net optical gain for CMOS-compatible diode lasers. Here we systematically present theoretical modeling, material growth methods, spontaneous emission, optical gain, and lasing under optical and electrical pumping from band-engineered Ge-on-Si, culminated by recently demonstrated electrically pumped Ge-on-Si lasers with >1 mW output in the communication wavelength window of 1500-1700 nm. The broad gain spectrum enables on-chip wavelength division multiplexing. A unique feature of band-engineered pseudo-direct gap Ge light emitters is that the emission intensity increases with temperature, exactly opposite to conventional direct gap semiconductor light-emitting devices. This extraordinary thermal anti-quenching behavior greatly facilitates monolithic integration on Si microchips where temperatures can reach up to 80 degrees C during operation. The same band-engineering approach can be extended to other pseudo-direct gap semiconductors, allowing us to achieve efficient light emission at wavelengths previously considered inaccessible.
引用
收藏
页数:13
相关论文
共 72 条
  • [61] PROPERTIES OF HEAVILY DOPED N-TYPE GERMANIUM
    SPITZER, WG
    TRUMBORE, FA
    LOGAN, RA
    [J]. JOURNAL OF APPLIED PHYSICS, 1961, 32 (10) : 1822 - &
  • [62] Toward a Germanium Laser for Integrated Silicon Photonics
    Sun, Xiaochen
    Liu, Jifeng
    Kimerling, Lionel C.
    Michel, Jurgen
    [J]. IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 2010, 16 (01) : 124 - 131
  • [63] Optical Bleaching of Thin Film Ge on Si
    Sun, Xiaochen
    Liu, Jifeng
    Kimerling, Lionel C.
    Michel, Jurgen
    [J]. SIGE, GE, AND RELATED COMPOUNDS 3: MATERIALS, PROCESSING, AND DEVICES, 2008, 16 (10): : 881 - 889
  • [64] Room-temperature direct bandgap electroluminesence from Ge-on-Si light-emitting diodes
    Sun, Xiaochen
    Liu, Jifeng
    Kimerling, Lionel C.
    Michel, Jurgen
    [J]. OPTICS LETTERS, 2009, 34 (08) : 1198 - 1200
  • [65] Direct gap photoluminescence of n-type tensile-strained Ge-on-Si
    Sun, Xiaochen
    Liu, Jifeng
    Kimerling, Lionel C.
    Michel, Jurgen
    [J]. APPLIED PHYSICS LETTERS, 2009, 95 (01)
  • [66] Growth of highly strain-relaxed Ge1-xSnx/virtual Ge by a Sn precipitation controlled compositionally step-graded method
    Takeuchi, Shotaro
    Shimura, Yosuke
    Nakatsuka, Osamu
    Zaima, Shigeaki
    Ogawa, Masaki
    Sakai, Akira
    [J]. APPLIED PHYSICS LETTERS, 2008, 92 (23)
  • [67] BAND LINEUPS AND DEFORMATION POTENTIALS IN THE MODEL-SOLID THEORY
    VAN DE WALLE, CG
    [J]. PHYSICAL REVIEW B, 1989, 39 (03) : 1871 - 1883
  • [68] PHOTOLUMINESCENCE SPECTRA OF GERMANIUM AT HIGH EXCITATION INTENSITIES
    VANDRIEL, HM
    ELCI, A
    BESSEY, JS
    SCULLY, MO
    [J]. SOLID STATE COMMUNICATIONS, 1976, 20 (09) : 837 - 840
  • [69] RADIATIVE RECOMBINATION IN HEAVILY DOPED P-TYPE GERMANIUM
    WAGNER, J
    VINA, L
    [J]. PHYSICAL REVIEW B, 1984, 30 (12): : 7030 - 7036
  • [70] Wagner J., 1984, Energy Beam-Solid Interactions and Transient Thermal Processing Symposium, P147