Electrochromic properties of nickel oxide based thin films sputter deposited in the presence of water vapor

被引：30

作者：

Green, S. V. ^{[1
,2
]}

Watanabe, M. ^{[2
]}

Oka, N. ^{[2
]}

Niklasson, G. A. ^{[1
]}

Granqvist, C. G. ^{[1
]}

Shigesato, Y. ^{[2
]}

机构：

[1] Uppsala Univ, Dept Engn Sci, Angstrom Lab, SE-75121 Uppsala, Sweden

[2] Aoyama Gakuin Univ, Grad Sch Sci & Engn, Sagamihara, Kanagawa 2525258, Japan

来源：

THIN SOLID FILMS | 2012年 / 520卷 / 10期

基金：

瑞典研究理事会;

关键词：

Nickel oxide; Electrochromism; RF magnetron sputtering; Water vapor; Thin film; Optical properties; Charge capacity; TUNGSTEN-OXIDE; HYDRATED NIOY; DISCHARGE; HYDROXIDE; WINDOWS;

D O I：

10.1016/j.tsf.2011.08.030

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Electrochromic nickel oxide based thin films were prepared by reactive RF magnetron sputtering from metallic nickel in the presence of Ar, O-2 and H2O. The water vapor led to enhanced optical modulation and charge capacity. At a wavelength of 550 nm the bleached state transmittance was 0.73 and the transmittance for the colored state was 0.28 and 0.15 for water partial pressures of p(H2O)<10(-3) Pa and p(H2O) similar to 7 x 10(-2) Pa, respectively. The charge densities were 14 and 25 mC/cm(2) for p(H2O)<10(-3) Pa and P-H2O similar to 7 x 10(-2) Pa, respectively. The coloration efficiency was decreased with increased water partial pressure, from about 0.07 to 0.06 cm(2)/mC. Preliminary results show that the H2O promotes an amorphous structure and makes the films increasingly hydrous. (C) 2011 Elsevier B.V. All rights reserved.

引用

页码：3839 / 3842

页数：4

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