Femtosecond laser lithography and applications

被引:1
作者
Chichkov, B. N. [1 ]
Fadeeva, E. [1 ]
Koch, J. [1 ]
Ostendorf, A. [1 ]
Ovslanikov, A. [1 ]
Passinger, S. [1 ]
Reinhardt, C. [1 ]
机构
[1] Laser Zentrum Hannover eV, Hollerithallee 8, D-30419 Hannover, Germany
来源
PHOTON PROCESSING IN MICROELECTRONIC AND PHOTONICS V | 2006年 / 6106卷
关键词
laser lithography; ultrashort laser pulses; material processing;
D O I
10.1117/12.651664
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Rapid progress in ultrafast laser systems opened many exciting possibilities for high-resolution material processing. These laser systems allow to control and deliver optical energy and laser Pulses in time and space with unprecedented precision. It is not surprising that these high-quality optical pulses have revolutionized microfabrication technologies. Femtosecond lasers enabled processing of a wide range of materials (including heat sensitive and thermo-reactive) with a sub-micrometer resolution. At present, nearly arbitrary shaped 2D and 3D structures can be produced by direct write photofabrication techniques using femtosecond laser pulses. In this paper we present a brief review of our recent progress in femtosecond (maskless, direct-write, nonlinear) laser lithography and 3D photofabrication technique.
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页数:8
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