Selective Growth of Vertically Aligned Carbon Nanotubes by Double Plasma Chemical Vapour Deposition Technique

被引：4
|
作者：
Cabral, Gil [1 ]
Titus, Elby [1 ]
Misra, D. S. [2 ]
Gracio, J. [1 ]
机构：
[1] Univ Aveiro, Dept Mech Engn, Ctr Mech Technol & Automat, NRD, P-3810193 Aveiro, Portugal
[2] Indian Inst Technol, Dept Phys, Bombay 400076, Maharashtra, India
来源：
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY | 2008年 / 8卷 / 08期
关键词：
Carbon Nanotubes; Vertical Alignment; Chemical Vapour Deposition; Scanning Electron Microscopy; Raman Spectroscopy;
D O I：
10.1166/jnn.2008.AN05
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
The selective growth of vertically aligned carbon nanotubes (VACNTs) on large area copper substrates was carried out using a double plasma hot-filament chemical vapour deposition system. Three independent power supplies were used to produce two glow discharges within the vacuum reactor. The generation of two glow discharges and the efficient utilization of the electric fields, by controlling the key process parameters, enabled the production of VACNTs. Morphology, density and structure of carbon nanotubes were characterized using Scanning Electron Microscopy and Raman Spectroscopy.
引用
收藏
页码：4029 / 4032
页数：4
相关论文
共 50 条
  • [1] Vertically aligned carbon nanotubes synthesized by direct current plasma chemical vapour deposition
    Morjan, RE
    Maltsev, V
    Gromov, A
    Nerushev, OA
    Campbell, EEB
    FULLERENES AND NANOTUBES: THE BUILDING BLOCKS OF NEXT GENERATION NANODEVICES, 2003, 2003 (15): : 371 - 374
  • [2] Fabrication and field emission property studies of vertically aligned multiwalled carbon nanotubes grown by double plasma chemical vapour deposition technique
    Titus, E.
    Singh, M. K.
    Cabral, Gil
    Babu, Ramesh P.
    Blau, W. J.
    Gracio, J.
    DIAMOND AND RELATED MATERIALS, 2009, 18 (5-8) : 967 - 971
  • [3] Direct growth of vertically aligned carbon nanotubes on a planar carbon substrate by thermal chemical vapour deposition
    Liu, Xianming
    Baronian, Keith H. R.
    Downard, Alison J.
    CARBON, 2009, 47 (02) : 500 - 506
  • [4] Plasma Enhanced Chemical Vapour Deposition of Horizontally Aligned Carbon Nanotubes
    Cole, Matthew T.
    Milne, William I.
    MATERIALS, 2013, 6 (06) : 2262 - 2273
  • [5] Vertically aligned carbon nanotubes grown by plasma enhanced chemical vapor deposition
    Sato, H
    Tagegawa, H
    Saito, Y
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (06): : 2564 - 2568
  • [6] Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition
    Chhowalla, M
    Teo, KBK
    Ducati, C
    Rupesinghe, NL
    Amaratunga, GAJ
    Ferrari, AC
    Roy, D
    Robertson, J
    Milne, WI
    JOURNAL OF APPLIED PHYSICS, 2001, 90 (10) : 5308 - 5317
  • [7] Growth of Millimeter-Scale Vertically Aligned Carbon Nanotubes by Microwave Plasma Chemical Vapor Deposition
    Kim, Yooseok
    Song, Wooseok
    Lee, Seung Youb
    Shrestha, Sabita
    Jeon, Cheolho
    Choi, Won Chel
    Kim, Minkook
    Park, Chong-Yun
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (08)
  • [8] Direct growth of vertically aligned carbon nanotubes on stainless steel by plasma enhanced chemical vapor deposition
    Thapa, Arun
    Neupane, Suman
    Guo, Rui
    Jungjohann, Katherine L.
    Pete, Doug
    Li, Wenzhi
    DIAMOND AND RELATED MATERIALS, 2018, 90 : 144 - 153
  • [9] Low temperature growth of vertically aligned carbon nanotubes by thermal chemical vapor deposition
    Lee, CJ
    Son, KH
    Park, J
    Yoo, JE
    Huh, Y
    Lee, JY
    CHEMICAL PHYSICS LETTERS, 2001, 338 (2-3) : 113 - 117
  • [10] The Influences of H2Plasma Pretreatment on the Growth of Vertically Aligned Carbon Nanotubes by Microwave Plasma Chemical Vapor Deposition
    Sheng-Rui Jian
    Yuan-Tsung Chen
    Chih-Feng Wang
    Hua-Chiang Wen
    Wei-Ming Chiu
    Chu-Shou Yang
    Nanoscale Research Letters, 3
12345