A novel noria (water-wheel-like cyclic oligomer) derivative as a chemically amplified electron-beam resist material

被引：53

作者：

Kudo, Hiroto ^{[1
]}

Watanabe, Daisuke ^{[1
]}

Nishikubo, Tadatomi ^{[1
]}

Maruyama, Ken ^{[2
]}

Shimizu, Daisuke ^{[2
]}

Kai, Toshiyuki ^{[2
]}

Shimokawa, Tsutomu ^{[2
]}

Ober, Christopher K. ^{[3
]}

机构：

[1] Kanagawa Univ, Fac Engn, Dept Mat & Life Chem, Kanagawa Ku, Yokohama, Kanagawa 2218686, Japan

[2] JSR Corp, Semicond Mat Res Labs, Semicond Mat Lab, Yokaichi, Mie 5108552, Japan

[3] Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA

来源：

JOURNAL OF MATERIALS CHEMISTRY | 2008年 / 18卷 / 30期

关键词：

D O I：

10.1039/b805394d

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A novel ladder-type cyclic oligomer (molecular water-wheel noria) derivative containing t-butyl ester groups was synthesized. This derivative (noria-(COOBu)-Bu-t) had good thermal stability, good solubility in common organic solvents, and good film-forming ability. The photo-induced deprotection (UV irradiation for 30 min followed by heating at 130 degrees C) of films of noria-(COOBu)-Bu-t was examined in the presence of a photo-acid generator, and it was found that deprotection of the t-butyl groups proceeded smoothly to give the corresponding carboxylic acid derivative (noria-COOH). Furthermore, when noria-(COOBu)-Bu-t(71) (ratio of t-butyl ester groups: 71%) was examined as an electron-beam resist material, a clear line and space pattern was obtained at a resolution of 70 nm.

引用

页码：3588 / 3592

页数：5

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