Electronic structure of Ni and Mo silicides investigated by x-ray emission spectroscopy and density functional theory

被引:15
|
作者
Jarrige, Ignace
Capron, Nathalie
Jonnard, Philippe
机构
[1] CNRS, Lab Chim Phys Mat & Rayonnement, F-75231 Paris 05, France
[2] Univ Paris 06, LCPMR, F-75005 Paris, France
来源
PHYSICAL REVIEW B | 2009年 / 79卷 / 03期
关键词
bonds (chemical); crystal structure; density functional theory; electronic density of states; molybdenum compounds; nickel compounds; X-ray emission spectra; TRANSITION-METAL SILICIDES; PLANE-WAVE BASIS; BAND-STRUCTURE; DI-ALUMINIDES; THIN-FILMS; OF-STATES; NICKEL; NISI2; DISILICIDES; PHOTOEMISSION;
D O I
10.1103/PhysRevB.79.035117
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report a combined study of the electronic structure of NiSi(2), Ni(2)Si, MoSi(2), and Mo(5)Si(3) using x-ray emission spectroscopy and density functional theory. The local and partial metal d and Si p and sd densities of states (DOSs) are obtained for the four compounds both experimentally and theoretically. This allows refined insight into the Si-metal bonding interaction, shown to be determined by a competition between the effects of the lattice structure and of the spatial extent of the metal d wave function. The latter effect is found to prevail for all four compounds, based on the prominent Si-Mo pd hybridization found in the DOS of MoSi(2) and Mo(5)Si(3) and the dominant Ni-Ni dd interaction observed in the electronic structure of NiSi(2) and Ni(2)Si.
引用
收藏
页数:6
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