Chemical composition, microstructure and magnetic characteristics of yttrium iron garnet (YIG, Ce:YIG) thin films grown by rf magnetron sputter techniques

被引:10
作者
Park, MB [1 ]
Kim, BJ [1 ]
Cho, NH [1 ]
机构
[1] Inha Univ, Dept Ceram Engn, Inchon 402751, South Korea
关键词
FMR; sputter; thin film; YIG;
D O I
10.1109/20.801081
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
YIG thin films were grown by rf magnetron sputter techniques, We investigated the effect of post-deposition heat-treatment as well as various deposition parameters such as substrate materials, substrate temperature, sputter power, and sputter gas types on the crystallinity, chemical composition, microstructure and magnetic characteristics of the films, Post-deposition heat-treatment over 750 degrees C was applied to crystallize as-prepared amorphous films, and a strong tendency of particular crystallographic planes lying parallel to substrate surface was observed for the heat-treated film on GGG substrate. The chemical composition of the film exhibited a wide range of chemical stoichiometry depending on the oxygen fraction of the sputter gas, and in particular the compositions of the YIG and Ce:YIG films deposited in sputter gas with an oxygen fraction of 20% were Y2.88Fe3.84O12 and Ce0.24Y1.10Fe3.50O12, respectively. With raising the temperature of post-deposition heat-treatment from 900 degrees C to 1100 degrees C,the surface roughness of the film on GGG substrate increased, but coercive force as well as ferromagnetic resonance line width decreased.
引用
收藏
页码:3049 / 3051
页数:3
相关论文
共 7 条
[1]  
DOOLITTLE LR, 1985, NUCL INSTRUM METH B, V9, P334
[2]   GIANT FARADAY-ROTATION OF CE-SUBSTITUTED YIG-FILMS EPITAXIALLY GROWN BY RF SPUTTERING [J].
GOMI, M ;
SATOH, K ;
ABE, M .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1988, 27 (08) :L1536-L1538
[3]  
Konishi Y., 1991, MICROWAVE INTEGRATED
[4]  
LIDE DR, 1993, CRC HDB CHEM PHYSICS
[5]   BISMUTH-SUBSTITUTED AND ALUMINUM-SUBSTITUTED YIG SINGLE-CRYSTAL FILMS ON MODIFIED GADOLINIUM GALLIUM GARNET SINGLE-CRYSTAL SUBSTRATES [J].
MATSUMOTO, K ;
SASAKI, S ;
YAMANOBE, Y ;
YAMAGUCHI, K ;
FUJII, T ;
ASAHARA, Y .
JOURNAL OF APPLIED PHYSICS, 1991, 70 (03) :1624-1629
[6]   Sputter epitaxy of cerium yttrium iron garnet films on neodymium gallium garnet substrates [J].
Okamura, Y ;
Kawakami, T ;
Yamamoto, S .
JOURNAL OF APPLIED PHYSICS, 1997, 81 (08) :5653-5655
[7]   Ce-substituted yttrium iron garnet films prepared on Gd3Sc2Ga3O12 garnet substrates by sputter epitaxy [J].
Shintaku, T ;
Tate, A ;
Mino, S .
APPLIED PHYSICS LETTERS, 1997, 71 (12) :1640-1642