Compact Model for Short-Channel Junctionless Accumulation Mode Double Gate MOSFETs

被引:83
作者
Holtij, Thomas [1 ,2 ]
Graef, Michael [1 ,2 ]
Marie Hain, Franziska [1 ,2 ]
Kloes, Alexander [1 ]
Iniguez, Benjamin [2 ]
机构
[1] Tech Hsch Mittelhessen, Competence Ctr Nanotechnol & Photon, D-35390 Giessen, Germany
[2] Univ Rovira & Virgili, Dept Engn Elect Eect & Automat, E-43007 Tarragona, Spain
关键词
2-D analytical modeling; conformal mapping; drain-induced barrier lowering (DIBL); junctionless accumulation mode (JAM) MOSFET; physics-based compact model; subthreshold slope; threshold voltage; unified mobile charge density model;
D O I
10.1109/TED.2013.2281615
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A 2-D closed form, analytical compact model for long- and short-channel junctionless accumulation mode double gate MOSFETs is presented. The physics-based 2-D model for the potential is derived with the help of Poisson's equation and the conformal mapping technique by Schwarz-Christoffel. From this closed-form solution, we derive simple equations for the calculation of the threshold voltage V-T and subthreshold slope S. Using Lambert's W-function and a smoothing function for the transition between the depletion and accumulation regions, a unified charge model valid for all operating regimes is developed. Dependencies between the physical device parameters and their impact on the device performance are worked out. A comparison of our 2-D physics-based compact model is done versus 2-D technology computer-aided design (TCAD) Sentaurus simulation data.
引用
收藏
页码:288 / 299
页数:12
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