In2O3 films deposited by spray pyrolysis:: gas response to reducing (CO, H2) gases

This article discusses the influence of both technological modes and structural parameters of In2O3 films deposited by spray pyrolysis from InCl3 water solution on response to reducing gases (CO and H,). Conclusions were drawn on the main factors, which influence both gas response of In2O3 films and time constants of response and recovery processes. They are film thickness and porosity. It was established that films deposited at low pyrolysis temperatures (350-400 degreesC) from low precursor concentration solutions (<0.2 M) had maximal gas response and minimal constant times of both response, and recovery processes. (C) 2003 Elsevier B.V. All rights reserved.