In2O3 films deposited by spray pyrolysis:: gas response to reducing (CO, H2) gases

被引：79
作者：
Korotcenkov, G
Brinzari, V
Cerneavschi, A
Ivanov, M
Cornet, A
Morante, J
Cabot, A
Arbiol, J
机构：
[1] Tech Univ Moldova, Lab Microelect & Optoelect, Kishinev 2004, Moldova
[2] Univ Barcelona, Dept Elect, E-08007 Barcelona, Spain
来源：
SENSORS AND ACTUATORS B-CHEMICAL | 2004年 / 98卷 / 2-3期
关键词：
In2O3; spray pyrolysis; gas response; reducing gases;
D O I：
10.1016/j.snb.2003.09.009
中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
摘要：
This article discusses the influence of both technological modes and structural parameters of In2O3 films deposited by spray pyrolysis from InCl3 water solution on response to reducing gases (CO and H,). Conclusions were drawn on the main factors, which influence both gas response of In2O3 films and time constants of response and recovery processes. They are film thickness and porosity. It was established that films deposited at low pyrolysis temperatures (350-400 degreesC) from low precursor concentration solutions (<0.2 M) had maximal gas response and minimal constant times of both response, and recovery processes. (C) 2003 Elsevier B.V. All rights reserved.
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收藏
页码：122 / 129
页数：8
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