Development and Integration of a High Efficiency Baseline Leading to 23% IBC Cells

被引:17
作者
Aleman, M. [1 ]
Das, J. [1 ]
Janssens, T. [1 ]
Pawlak, B. [1 ]
Posthuma, N. [1 ]
Robbelein, J. [1 ]
Singh, S. [1 ]
Baert, K. [1 ]
Poortmans, J. [1 ]
Fernandez, J. [2 ]
Yoshikawa, K. [3 ]
Verlinden, P. J. [4 ]
机构
[1] IMEC, Kapeldreef 75, B-3001 Louvain, Belgium
[2] Schott Solar AG, D-63755 Alzenau, Germany
[3] Kaneka Belgium, B-3001 Leuven, Belgium
[4] Amrock Pty Ltd, McLaren Vale, SA 5171, Australia
来源
PROCEEDINGS OF THE 2ND INTERNATIONAL CONFERENCE ON CRYSTALLINE SILICON PHOTOVOLTAICS (SILICONPV 2012) | 2012年 / 27卷
关键词
Silicon; IBC; High-efficiency; Processing;
D O I
10.1016/j.egypro.2012.07.122
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
This paper presents the development of single step processes and their integration into a baseline for the lab scale manufacturing of high efficiency IBC cells. The main processes evaluated include cleaning, oxidation, boron and phosphorous doping. Three different cleaning treatments, combined with the optimization of thermal oxidation, have been studied. Lifetime values up to 8 ms at an injection level of 1.10(15) cm(-3) have been achieved on 280 mu m, n-Si FZ wafers with a base resistivity of 1.9 Omega.cm. Boron diffusion is evaluated starting from a boron-doped SiOx CVD layer and compared to the diffusion from a BBr3 source. Both doping processes enable J(0) values as low as 10 fA/cm(2) with a thermal silicon oxide passivation. We present the evolution of the integration runs as a result from the introduction of the improved steps. With the latest improvements, IV characteristics progressed from efficiencies similar to 20% up to 23.3% (calibrated IV values: 696 mV, 41.6 mA/cm(2), FF=80.4% with an efficiency of 23.3%). (C) 2012 Published by Elsevier Ltd. Selection and peer-review under responsibility of the scientific committee of the SiliconPV 2012 conference.
引用
收藏
页码:638 / 645
页数:8
相关论文
共 8 条
[1]  
Cousins P. J., 2010, P 35 IEEE PVSEC HAW
[2]   A UNIFYING STUDY OF TANDEM-JUNCTION, FRONT-SURFACE-FIELD, AND INTERDIGITATED-BACK-CONTACT SOLAR-CELLS [J].
FOSSUM, JG ;
NEUGROSCHEL, A ;
LINDHOLM, FA .
SOLID-STATE ELECTRONICS, 1980, 23 (11) :1127-1138
[3]   Excellent passivation of highly doped p-type Si surfaces by the negative-charge-dielectric Al2O3 [J].
Hoex, B. ;
Schmidt, J. ;
Bock, R. ;
Altermatt, P. P. ;
van de Sanden, M. C. M. ;
Kessels, W. M. M. .
APPLIED PHYSICS LETTERS, 2007, 91 (11)
[4]  
King R., 1990, THESIS
[5]  
Pawlak B., 2012, P 2 INT C CRYST SIL
[6]  
RAND JA, 1991, IEEE PHOT SPEC CONF, P192, DOI 10.1109/PVSC.1991.169207
[7]  
Sinton R., 1987, THESIS
[8]  
Verlinden P.J., 2012, P 2 INT C CRYST SIL