Design, Fabrication and Material Properties of Temperature Stable Performance Consistent Tunable Devices

被引:2
作者
Cole, M. W. [1 ]
Hirsch, S. [1 ]
Ngo, E. [1 ]
Hubbard, C. [1 ]
机构
[1] USA, Res Lab, Weap & Mat Res Directorate, Aberdeen Proving Ground, MD 21005 USA
关键词
temperature stable phase shifter device; dielectric properties; device integration;
D O I
10.1080/10584580802470991
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The premier candidate active material for tunable microwave phase shifter devices is single composition, paraelectric BaSrTiO(3) (BST). However, there is concern that in practical applications the device performance will be compromised due to the temperature dependence of the BST based device capacitance. We report a device design which controls the magnitude and the sign of the temperature coefficient of capacitance (TCC) via a multilayer paraelectric BST/buffer layer/ferroelectric BST coplanar device structure. To realize this multilayer device structure we have designed, fabricated, and optimized a 10 mol% Al doped Ta(2)O(5) barrier layer with low loss (tan delta = 0.004), moderate permittivity (epsilon(r) = 42.8), low TCC (-20 ppm/degrees C), and a low bias stability of capacitance (0.4%). The thin film integration of the barrier layerwith the BST layers was optimized for structure, microstructure, interfacial/surface morphology, and dielectric properties as a function of Al doping concentration, annealing temperature, material growth and integration process parameters.
引用
收藏
页码:182 / 194
页数:13
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