Systematic study of the focal shift effect in planar plasmonic slit lenses

被引:35
作者
Hu, Bin [1 ]
Wang, Qi Jie [1 ,2 ]
Zhang, Ying [3 ]
机构
[1] Nanyang Technol Univ, Sch Elect & Elect Engn, Div Microelect, Singapore 639798, Singapore
[2] Nanyang Technol Univ, Sch Phys & Math Sci, Div Phys & Appl Phys, Singapore 637371, Singapore
[3] Singapore Inst Mfg Technol, Singapore 638075, Singapore
关键词
NANO-SLITS; LIGHT;
D O I
10.1088/0957-4484/23/44/444002
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In this paper, we systematically studied the focal shift effect in planar plasmonic slit lenses. Through theoretical derivations and numerical simulations, we found that there is a focal length shift between the traditional design model and the finite-difference time-domain simulations. The shift is not only dependent on the Fresnel number (FN) of the lens, like traditional dielectric lenses, determined by the lens width and the designed focal length, but also on the surface plasmon polariton (SPPs) interaction on the lens surfaces, dependent on the slit numbers. We also found that the FN-induced focal shift is predominant when FN < 1. However, the SPP interaction-induced focal shift plays a major role when FN > 1. An approximated theoretical model is presented to estimate the focal shift of plasmonic slit lens with FN < 1.
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收藏
页数:9
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