Silicon on Thin Buried Oxide (SOTB) Technology for Ultralow-Power Applications

被引:0
作者
Sugii, N. [1 ]
Iwamatsu, T. [1 ]
Yamamoto, Y. [1 ]
Makiyama, H. [1 ]
Shinohara, H. [1 ]
Aono, H. [1 ]
Oda, H. [1 ]
Kamohara, S. [1 ]
Yamaguchi, Y. [1 ]
Mizutani, T. [2 ]
Hiramoto, Toshiro [2 ]
机构
[1] Low Power Elect Assoc & Project LEAP, Ibaraki 3058569, Japan
[2] Univ Tokyo, Inst Ind Sci, Tokyo 153, Japan
来源
2013 INTERNATIONAL CONFERENCE ON SEMICONDUCTOR TECHNOLOGY FOR ULTRA LARGE SCALE INTEGRATED CIRCUITS AND THIN FILM TRANSISTORS (ULSIC VS. TFT 4) | 2013年 / 54卷 / 01期
关键词
D O I
10.1149/05401.0189ecst
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Demands for low-power CMOS devices are still increasing. Ultralow-voltage operation of CMOS with maximum power efficiency can extend the opportunity of using the electron devices to power-conscious applications such as ubiquitous sensor network, etc. The main issues for low-power (highly efficient) operation of the modern scaled CMOS are reducing variability and enabling adaptive control of circuit performance and power consumption under the operation at voltages as low as possible. In order to solve these issues, we are developing the silicon-on-thin-buried-oxide (SOTB) transistors. We show features of the SOTB, transistor technology dedicated for ultralow-voltage (down to 0.4 V) operation, circuit design applicable for SOTB and we discuss on the performance projection and ULV application with SOTB.
引用
收藏
页码:189 / 196
页数:8
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