On-product metrology results from MEBES 4-TFE system

被引：0
|
作者：
Braun, C
Peiffer, F
机构：
来源：
16TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT | 1996年 / 2884卷
关键词：
e-beam; MEBES; lithography; metrology;
D O I：
10.1117/12.262832
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
At Lucent Technologies, lithography tool performance metric measurements are required on every plate. The QA cell patterning is designed to monitor the lithography tool, and the data is captured within the Mask Information Management System (MIMS). It allows the manufacturer to use actual production data to determine machine performance trends, and it yields an extremely large sample of plates for SPC purposes. Closure, X vs. Y uniformity, butting, and registration data is reported in this way. The usage of on-product data for machine metrology is demonstrated, and actual production performance of the MEBES 4 TFE is shown.
引用
收藏
页码：37 / 45
页数：9
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