Silicon Patterning Using Self-assembled PS-b-PAA Diblock Copolymer Masks for Black Silicon Fabrication via Plasma Etching

被引：9
|
作者：
Zhang, Xin [1 ]
Sushkov, Andrei B. [2 ,3 ]
Metting, Christopher J. [1 ]
Fackler, Sean [1 ]
Drew, H. Dennis [2 ,3 ]
Briber, R. M. [1 ]
机构：
[1] Univ Maryland, Dept Mat & Engn, College Pk, MD 20742 USA
[2] Univ Maryland, Mat Res Sci & Engn Ctr, College Pk, MD 20742 USA
[3] Univ Maryland, Ctr Nanophys & Adv Mat, Dept Phys, College Pk, MD 20742 USA
来源：
PLASMA PROCESSES AND POLYMERS | 2012年 / 9卷 / 10期
关键词：
antireflection; block copolymer; metamaterial; nanostructures; reactive-ion etching (RIE); BLOCK-COPOLYMER; SOLAR-CELLS; RESISTANCE; SURFACES;
D O I：
10.1002/ppap.201100198
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The poly(styrene-b-acrylic acid) diblock copolymer is utilized as a novel self-assembling mask material suitable for pattern transfer applications. This material system has high dry etch selectivity and can produce a variety of feature types and size scales. Different vertical profiles were produced by altering the etch recipes and diblock copolymer or SiO2 mask processing. This patterning technique is used to fabricate antireflective silicon metamaterials that show broadband antireflection properties in the visible and infrared wavelength range. These materials are potentially useful for solar cell and light sensing applications.
引用
收藏
页码：968 / 974
页数：7
相关论文
共 11 条
  • [1] Formation of black silicon using SiGe self-assembled islands as a mask for selective anisotropic etching of silicon
    Yurasov, D. V.
    Novikov, A. V.
    Shaleev, M. V.
    Baidakova, N. A.
    Morozova, E. E.
    Skorokhodov, E. V.
    Ota, Y.
    Hombe, A.
    Kurokawa, Y.
    Usami, N.
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2018, 75 : 143 - 148
  • [2] Large-Scale Preparation of Uniform Nanopatterned Silicon Substrates by Inductively Coupled Plasma Etching Using Self-Assembled Anodic Alumina Masks
    Tian, Ji-Li
    Wang, Gui-Gen
    Zhang, Hua-Yu
    Han, Jie-Cai
    ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2016, 5 (06) : P320 - P323
  • [3] Reactive ion beam etching of fused silica using vertical lamellar patterns of PS-b-PMMA diblock copolymer masks
    Zajadacz, Joachim
    Lorenz, Pierre
    Frost, Frank
    Fechner, Renate
    Steinberg, Christian
    Scheer, Hella-Christin
    Zimmer, Klaus
    MICROELECTRONIC ENGINEERING, 2015, 141 : 289 - 293
  • [4] Sub-10 nm Silicon Nanopillar Fabrication Using Fast and Brushless Thermal Assembly of PS-b-PDMS Diblock Copolymer
    Garnier, Jerome
    Arias-Zapata, Javier
    Marconot, Olivier
    Arnaud, Sandrine
    Boehme, Sophie
    Girardot, Cecile
    Buttard, Denis
    Zelsmann, Marc
    ACS APPLIED MATERIALS & INTERFACES, 2016, 8 (15) : 9954 - 9960
  • [5] Fabrication of ultrahigh aspect ratio silicon nanostructures using self-assembled gold metal-assisted chemical etching
    Duran, Joshua M.
    Sarangan, Andrew
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2017, 16 (01):
  • [6] Plasma-etching fabrication and properties of black silicon by using sputtered silver nanoparticles as micromasks
    Bi, Yanming
    Su, Xiaodong
    Zou, Shuai
    Xin, Yu
    Dai, Zhihua
    Huang, Jie
    Wang, Xusheng
    Zhang, Linjun
    THIN SOLID FILMS, 2012, 521 : 176 - 180
  • [7] Selective confinement of oleylamine capped Au nanoparticles in self-assembled PS-b-PEO diblock copolymer templates
    Di Mauro, A. Evelyn
    Striccoli, Marinella
    Depalo, Nicoletta
    Fanizza, Elisabetta
    Cano, Laida
    Ingrosso, Chiara
    Agostiano, Angela
    Curri, M. Lucia
    Tercjak, Agnieszka
    SOFT MATTER, 2014, 10 (11) : 1676 - 1684
  • [8] Controllable Fabrication of Silicon Nanopore Arrays by Two-Step Inductively Coupled Plasma Etching Using Self-Assembled Anodic Aluminum Oxide Mask
    Tian, Jili
    Meng, Xianghua
    Liu, Yang
    Cui, Jie
    Li, Min
    Fan, Kaiguo
    Zhang, Qi
    Zhang, Huayu
    ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2023, 12 (06)
  • [9] Fabrication and Unique Optical Properties of Two-Dimensional Silver Nanorod Arrays with Nanometer Gaps on a Silicon Substrate from a Self-Assembled Template of Diblock Copolymer
    Fujikawa, Shigenori
    Koizumi, Mari
    Taino, Akiko
    Okamoto, Koichi
    LANGMUIR, 2016, 32 (47) : 12504 - 12510
  • [10] Fabrication of flexible silicon nanowires by self-assembled metal assisted chemical etching for surface enhanced Raman spectroscopy
    Kara, S. A.
    Keffous, A.
    Giovannozzi, A. M.
    Rossi, A. M.
    Cara, E.
    D'Ortenzi, L.
    Sparnacci, K.
    Boarino, L.
    Gabouze, N.
    Soukane, S.
    RSC ADVANCES, 2016, 6 (96) : 93649 - 93659
12