Tensile testing system for sub-micrometer thick film

被引:0
|
作者
Tsuchiya, T [1 ]
Shikida, M [1 ]
Sato, K [1 ]
机构
[1] Nagoya Univ, Dept Micro Syst Engn, Nagoya, Aichi 4648603, Japan
关键词
tensile test; electrostatic force grip; single crystal silicon;
D O I
暂无
中图分类号
R318 [生物医学工程];
学科分类号
0831 ;
摘要
A new type of tensile tester for sub-microirieter-thick films has been developed. The tester is has a grip that allows chucking one end of a thin-film specimen by electrostatic force while the other end is fixed to a silicon substrate. It uses a servo-controlled balance for small-force measurement. Sub-micrometer-thick single-crystal-silicon specimens were fabricated using bulk micromachining starting with a SIMOX wafer. The specimens were 0 to 300 mum long, 20 or 50 mum wide and 0.14 mum thick. The tensile strength ranged from 1.4 to 4.3 GPa for six samples; the longer the specimen the lower strength.
引用
收藏
页码:1378 / 1381
页数:4
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