Recent progress in epitaxial growth of III-V quantum-dot lasers on silicon substrate

被引:36
作者
Pan, Shujie [1 ]
Cao, Victoria [1 ]
Liao, Mengya [1 ]
Lu, Ying [1 ]
Liu, Zizhuo [1 ]
Tang, Mingchu [1 ]
Chen, Siming [1 ]
Seeds, Alwyn [1 ]
Liu, Huiyun [1 ]
机构
[1] UCL, Dept Elect & Elect Engn, London WC1E 7JE, England
基金
英国工程与自然科学研究理事会;
关键词
quantum dots; silicon photonics; epitaxial growth; semiconductor laser; MU-M; LOW-THRESHOLD; OPTICAL-PROPERTIES; MICRODISK LASERS; SI SUBSTRATE; HIGH-SPEED; ARRAY; GAAS; PHOTODETECTORS; INTEGRATION;
D O I
10.1088/1674-4926/40/10/101302
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
In the past few decades, numerous high-performance silicon (Si) photonic devices have been demonstrated. Si, as a photonic platform, has received renewed interest in recent years. Efficient Si-based III-V quantum-dot (QDs) lasers have long been a goal for semiconductor scientists because of the incomparable optical properties of III-V compounds. Although the material dissimilarity between III-V material and Si hindered the development of monolithic integrations for over 30 years, considerable breakthroughs happened in the 2000s. In this paper, we review recent progress in the epitaxial growth of various III-V QD lasers on both offcut Si substrate and on-axis Si (001) substrate. In addition, the fundamental challenges in monolithic growth will be explained together with the superior characteristics of QDs.
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页数:9
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