Cl-intercalated graphene on SiC: Influence of van der Waals forces

被引:11
作者
Cheng, Y. C. [1 ]
Zhu, Z. Y. [1 ]
Schwingenschloegl, U. [1 ]
机构
[1] KAUST, PSE Div, Thuwal 239556900, Saudi Arabia
关键词
GRAPHITE;
D O I
10.1209/0295-5075/101/27008
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The atomic and electronic structures of Cl-intercalated epitaxial graphene on SiC are studied by first-principles calculations. By increasing the Cl concentration, doping levels from n-type to slightly p-type are achieved on the SiC(0001) surface, while a wider range of doping levels is possible on the SiC(0001) surface. We find that the Cl atoms prefer bonding to the substrate rather than to the graphene. By varying the Cl concentration the doping level can be tailored. Consideration of van der Waals forces improves the distance between the graphene and the substrate as well as the binding energy, but it is not essential for the formation energy. For understanding the doping mechanism the introduction of non-local van der Waals contributions to the exchange correlation functional is shown to be essential. Copyright (C) EPLA, 2013
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页数:5
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