Growth of nanoporous silicon dioxide thin films using porous alumina substrates

被引：8
作者：
Chen, Feng [1 ]
Kitai, Adrian H. [2 ,3 ]
机构：
[1] McMaster Univ, Dept Mat Sci & Engn, Hamilton, ON L8S 2N5, Canada
[2] McMaster Univ, Dept Engn Phys, Hamilton, ON L8S 2N5, Canada
[3] McMaster Univ, Dept Mat Sci & Engn, Hamilton, ON L8S 2N5, Canada
来源：
THIN SOLID FILMS | 2008年 / 517卷 / 02期
关键词：
Nanoporous; Thin film; Porous alumina; Self-organized; Sputtering;
D O I：
10.1016/j.tsf.2008.07.009
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
In this paper, we report a cost-effective and highly reproducible method for the deposition of porous SiO2 thin films by using commercially available porous alumina membranes and radio-frequency magnetron sputtering method. Due to the porous surface of the substrate and its narrow and long channels, the SiO2 thin films partially cover the pores of the alumina membranes and self-organized porous network structures are formed. The pore size depends on the thickness of the films. The morphology of the thin films consists of patterned islands which gradually coalesce together during the growth of the thin films. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码：622 / 625
页数：4
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