Optimization of Polarization-Dependent Loss of Arrayed Waveguide Grating Demultiplexer

被引：7

作者：

Sun Jian ^{[1
,2
]}

Wu Yuanda ^{[2
]}

Wu Weifeng ^{[2
]}

Shan Chongxin ^{[1
]}

机构：

[1] Zhengzhou Univ, Sch Phys, Zhengzhou 150001, Henan, Peoples R China

[2] Henan Shijia Photons Technol Co Ltd, Hebi 458030, Henan, Peoples R China

来源：

CHINESE JOURNAL OF LASERS-ZHONGGUO JIGUANG | 2020年 / 47卷 / 01期

关键词：

optical communications; array waveguide grating; demultiplexer; polarization dependent loss;

D O I：

10.3788/CJL202047.0106003

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

In this work, the polarization-dependent loss (PDL) of a SiO2/Si arrayed waveguide demultiplexer (AWG DEMUX) is optimized. The physical factors causing the polarization dependence of the AWG and the process methods and conditions required to eliminate this dependence arc analyzed theoretically. AWG DEMUX chips arc fabricated by semiconductor processes, such as chemical-vapor deposition, photolithography, and etching. The boron and phosphorus contents in the cladding material arc optimized and adjusted according to theoretical analysis. The PDLs of the chips arc successfully reduced to 0. 12 dB so that the PDL parameters meet the chip's commercialization requirements.

引用

页数：5

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