Influence of Treatment of Hydrogen Plasma on Field Emission Properties of Carbon Nanotubes Films

被引：0
|
作者：
Fan, Zhi-qin [1 ]
Ou, Hai-feng [1 ]
Li, Rui [1 ]
Cai, Gen-wang [1 ]
Zhang Jun-de [1 ]
机构：
[1] Henan Univ Technol, Coll Sci, Zhengzhou 450001, Peoples R China
来源：
EMERGING FOCUS ON ADVANCED MATERIALS, PTS 1 AND 2 | 2011年 / 306-307卷
关键词：
Carbon nanotubes; MPCVD; Field emission; EMITTERS;
D O I：
10.4028/www.scientific.net/AMR.306-307.1170
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Carbon nanotubes(CNTs) films were fabricated by microwave plasma chemical vapor deposition (MPCVD) on stainless steel substrates. In order to study the reason that its emission current weakens, the CNTs films were treated by hydrogen plasma. The research discovered that the hydrogen plasma treatment to the carbon nanotubes films reduced the surface work function of the film and its filed emission current, this mainly due to the etching of hydrogen plasma to sp(2) carbon on the surface, it leads emission area to decrease.
引用
收藏
页码：1170 / 1173
页数：4
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