Effects of Cu intercalation on the graphene/Ni(111) surface: Density-functional calculations

被引:4
|
作者
Kwon, Se Gab [1 ]
Kang, Myung Ho [1 ]
机构
[1] Pohang Univ Sci & Technol, Dept Phys, Pohang 790784, South Korea
基金
新加坡国家研究基金会;
关键词
Graphene; Cu intercalation; Ni(111); Density-functional calculations; AUGMENTED-WAVE METHOD; NI(111); TRANSISTORS; TRANSPORT; SYSTEMS; PHASE; GAS;
D O I
10.3938/jkps.61.589
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The Cu-intercalated graphene/Ni(111) surface has been studied by using density-functional theory calculations. We find that (1) the intercalation-induced decoupling between graphene and the Ni(111) substrate begins sharply at a Cu coverage of about 0.75 ML, (2) at the optimal Cu coverage of 1 ML, graphene recovers an almost ideal Dirac-cone band structure with no band gap, and (3) the Dirac point is located at 0.17 eV below the Fermi level, indicating a small charge transfer from the substrate. Cu thus plays essentially the same role as Au in realizing quasi-free-standing graphene by intercalation. Our charge character analysis shows that the Dirac-cone bands near the Fermi level reveal a weakening of their pi character when crossing the Ni d bands, suggesting that the resulting low Dirac-cone intensity could possibly be the origin of the recent photoemission report of a relatively large band gap of 0.18 eV.
引用
收藏
页码:589 / 593
页数:5
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