Comparative Study of Silicon-Based Ultraviolet Photodetectors

被引:168
作者
Shi, Lei [1 ]
Nihtianov, Stoyan [1 ]
机构
[1] Delft Univ Technol, Elect Instrumentat Lab, Dept Microelect & Comp Engn, NL-2628 CD Delft, Netherlands
关键词
Photodiode; responsivity; ultraviolet (UV) radiation; ELECTRON-HOLE PAIR; NM SPECTRAL RANGE; HIGH-TEMPERATURE; PHOTODIODES; RADIATION; RESPONSIVITY; DETECTORS; LITHOGRAPHY; METROLOGY; PHOTONS;
D O I
10.1109/JSEN.2012.2192103
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This review article presents a comparative study of different silicon-based ultraviolet (UV) photodetector technologies. After a brief introduction and classification of UV photodetectors, a general comparison is made between the two most popular UV-detector solid-state materials: silicon and wideband gap semiconductors (diamond, SiC, III-nitrides, and some III-V compounds). Particularly, the advantages of the Si-based technologies are discussed. Further in this paper, the analyses are restricted to silicon UV photodetectors. The theoretically attainable sensitivity in the UV spectral range of Si-based photodetectors is discussed. Different device structures and their working principle are shortly reviewed, followed by a comparison of the state-of-the-art Si-based UV photodetectors. By linking the device structure to the reported optical performance, the advantages and drawbacks of different structures are detailed. Finally, a number of key factors for designing high performance Si-based photodetectors are proposed.
引用
收藏
页码:2453 / 2459
页数:7
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