Separate control of the ion flux and ion energy in capacitively coupled radio-frequency discharges using voltage waveform tailoring

被引：89

作者：

Lafleur, T. ^{[1
]}

Delattre, P. A. ^{[1
]}

Johnson, E. V. ^{[1
]}

Booth, J. P. ^{[1
]}

机构：

[1] Ecole Polytech, CNRS, LPP, F-91128 Palaiseau, France

来源：

APPLIED PHYSICS LETTERS | 2012年 / 101卷 / 12期

关键词：

HAIRPIN RESONATOR;

D O I：

10.1063/1.4754692

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We experimentally characterize an argon plasma in a geometrically symmetric, capacitively coupled rf discharge, excited by pulse-type tailored waveforms (generated using multiple voltage harmonics). The results confirm a number of predictions made by recent particle-in-cell simulations of a similar system and demonstrate a unique form of control over the ion flux and ion energy in capacitively coupled plasmas; by increasing the number of applied harmonics (equivalent to decreasing the pulse width), it is possible to increase the plasma density and ion flux (together with the power deposition) while keeping the average ion energy on one of the electrodes low and constant. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4754692]

引用

页数：4

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