ITO thin film strain gauge;
heat treatment;
high temperature strain measurement;
temperature coefficient of resistance;
PRESSURE;
D O I:
10.11868/j.issn.1001-4381.2018.000875
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
High temperature thin film strain gauges are widely used in the strain measurement of extreme conditions, especially in the high temperature components. ITO thin film strain gauges can generally be applied to the strain measurements above 1000 degrees C. ITO high temperature thin film strain gauge was fabricated on the ceramic substrate using magnetron sputtering, and then was thermal treated at high temperature in pure N-2 atmosphere, with the purpose of studying its microstructure, XPS, temperature resistance characteristics and piezoresistive response. The results show that the temperature coefficient of resistance (TCR) of ITO thin film strain gauge can stabilize at -750 X 10(-6) degrees C-1. In addition, ITO thin film strain gauge is loaded at 1200 degrees C, and the results show that the drift rate is 0. 0018 h(-1) and the strain factor is 16. Stable TCR and low drift rate of ITO thin film strain gauge provide the possibility for its application in the strain measurement of the hot end components.
机构:
Univ Sao Paulo, Lab Sistemas Integraveis, Escola Politecn, LSI PSI EPUSP, BR-05508900 Sao Paulo, BrazilUniv Sao Paulo, Lab Sistemas Integraveis, Escola Politecn, LSI PSI EPUSP, BR-05508900 Sao Paulo, Brazil
Rasia, L. A.
Mansano, R. D.
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机构:
Univ Sao Paulo, Lab Sistemas Integraveis, Escola Politecn, LSI PSI EPUSP, BR-05508900 Sao Paulo, BrazilUniv Sao Paulo, Lab Sistemas Integraveis, Escola Politecn, LSI PSI EPUSP, BR-05508900 Sao Paulo, Brazil
Mansano, R. D.
Damiani, L. R.
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h-index: 0
机构:
Univ Sao Paulo, Lab Sistemas Integraveis, Escola Politecn, LSI PSI EPUSP, BR-05508900 Sao Paulo, BrazilUniv Sao Paulo, Lab Sistemas Integraveis, Escola Politecn, LSI PSI EPUSP, BR-05508900 Sao Paulo, Brazil
Damiani, L. R.
Viana, C. E.
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h-index: 0
机构:
Univ Sao Paulo, Lab Sistemas Integraveis, Escola Politecn, LSI PSI EPUSP, BR-05508900 Sao Paulo, BrazilUniv Sao Paulo, Lab Sistemas Integraveis, Escola Politecn, LSI PSI EPUSP, BR-05508900 Sao Paulo, Brazil
机构:
Univ Sao Paulo, Lab Sistemas Integraveis, Escola Politecn, LSI PSI EPUSP, BR-05508900 Sao Paulo, BrazilUniv Sao Paulo, Lab Sistemas Integraveis, Escola Politecn, LSI PSI EPUSP, BR-05508900 Sao Paulo, Brazil
Rasia, L. A.
Mansano, R. D.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Sao Paulo, Lab Sistemas Integraveis, Escola Politecn, LSI PSI EPUSP, BR-05508900 Sao Paulo, BrazilUniv Sao Paulo, Lab Sistemas Integraveis, Escola Politecn, LSI PSI EPUSP, BR-05508900 Sao Paulo, Brazil
Mansano, R. D.
Damiani, L. R.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Sao Paulo, Lab Sistemas Integraveis, Escola Politecn, LSI PSI EPUSP, BR-05508900 Sao Paulo, BrazilUniv Sao Paulo, Lab Sistemas Integraveis, Escola Politecn, LSI PSI EPUSP, BR-05508900 Sao Paulo, Brazil
Damiani, L. R.
Viana, C. E.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Sao Paulo, Lab Sistemas Integraveis, Escola Politecn, LSI PSI EPUSP, BR-05508900 Sao Paulo, BrazilUniv Sao Paulo, Lab Sistemas Integraveis, Escola Politecn, LSI PSI EPUSP, BR-05508900 Sao Paulo, Brazil