Fabrication and piezoresistance of high temperature ITO thin film strain gauge

被引:0
|
作者
Yang Shen-yong [1 ]
Zhang Cong-chun [1 ]
Yang Zhuo-qing [1 ]
Li Hong-fang [1 ]
Yao Jin-yuan [1 ]
Huang Man-guo [2 ]
Wang Hong [1 ]
Ding Gui-fu [1 ]
机构
[1] Shanghai Jiao Tong Univ, Natl Key Lab Sci & Technol Micro Nano Fabricat, Shanghai 200240, Peoples R China
[2] AVIC Beijing Changcheng Aeronaut Measurement & Co, Beijing 101111, Peoples R China
来源
CAILIAO GONGCHENG-JOURNAL OF MATERIALS ENGINEERING | 2020年 / 48卷 / 04期
关键词
ITO thin film strain gauge; heat treatment; high temperature strain measurement; temperature coefficient of resistance; PRESSURE;
D O I
10.11868/j.issn.1001-4381.2018.000875
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
High temperature thin film strain gauges are widely used in the strain measurement of extreme conditions, especially in the high temperature components. ITO thin film strain gauges can generally be applied to the strain measurements above 1000 degrees C. ITO high temperature thin film strain gauge was fabricated on the ceramic substrate using magnetron sputtering, and then was thermal treated at high temperature in pure N-2 atmosphere, with the purpose of studying its microstructure, XPS, temperature resistance characteristics and piezoresistive response. The results show that the temperature coefficient of resistance (TCR) of ITO thin film strain gauge can stabilize at -750 X 10(-6) degrees C-1. In addition, ITO thin film strain gauge is loaded at 1200 degrees C, and the results show that the drift rate is 0. 0018 h(-1) and the strain factor is 16. Stable TCR and low drift rate of ITO thin film strain gauge provide the possibility for its application in the strain measurement of the hot end components.
引用
收藏
页码:145 / 150
页数:6
相关论文
共 24 条
  • [1] [Anonymous], GAS TURBINES POWER
  • [2] Cullity B.D., 1978, ELEMENTS XRAY DIFFRA
  • [3] CUNZEMAN K, 2009, AIAA SPAC 2009 C EXP, P14
  • [4] The role of oxygen and hydrogen partial pressures on structural and optical properties of ITO films deposited by reactive rf-magnetron sputtering
    Das, Rajesh
    Adhikary, Koel
    Ray, Swati
    [J]. APPLIED SURFACE SCIENCE, 2007, 253 (14) : 6068 - 6073
  • [5] Effect of sputtering pressure and annealing temperature on the properties of indium tin oxide thin films
    Gheidari, A. Mohammadi
    Behafarid, F.
    Kavei, G.
    Kazemad, M.
    [J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2007, 136 (01): : 37 - 40
  • [6] Ceramic temperature sensors for harsh environments
    Gregory, OJ
    You, T
    [J]. IEEE SENSORS JOURNAL, 2005, 5 (05) : 833 - 838
  • [7] Piezoresistive properties of ITO strain sensors prepared with controlled nanoporosity
    Gregory, OJ
    You, T
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2004, 151 (08) : H198 - H203
  • [8] Effect of Annealing on the Properties of Indium-Tin-Oxynitride Films as Ohmic Contacts for GaN-Based Optoelectronic Devices
    Himmerlich, Marcel
    Koufaki, Maria
    Ecke, Gernot
    Mauder, Christof
    Cimalla, Volker
    Schaefer, Juergen A.
    Kondilis, Antonis
    Pelekanos, Nikos T.
    Modreanu, Mircea
    Krischok, Stefan
    Aperathitis, Elias
    [J]. ACS APPLIED MATERIALS & INTERFACES, 2009, 1 (07) : 1451 - 1456
  • [9] LOW RESISTIVITY INDIUM TIN OXIDE TRANSPARENT CONDUCTIVE FILMS .2. EFFECT OF SPUTTERING VOLTAGE ON ELECTRICAL PROPERTY OF FILMS
    ISHIBASHI, S
    HIGUCHI, Y
    OTA, Y
    NAKAMURA, K
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03): : 1403 - 1406
  • [10] Characterization of sputtered nichrome (Ni-Cr 80/20 wt.%) films for strain gauge application
    Kazi, Imam H.
    Wild, P. M.
    Moore, T. N.
    Sayer, M.
    [J]. THIN SOLID FILMS, 2006, 515 (04) : 2602 - 2606