Ultrafast Laser-Induced Two-Photon Photopolymerization of SU-8 High-Aspect-Ratio Structures and Nanowire

被引：5

作者：

Kong, Hong Jin ^{[1
]}

Yi, Shin Wook ^{[1
]}

Yang, Dong-Yol ^{[2
]}

Lee, Kwang-Sup ^{[3
]}

机构：

[1] Korea Adv Inst Sci & Technol, Dept Phys, Taejon 305701, South Korea

[2] Korea Adv Inst Sci & Technol, Dept Mech Engn, Taejon 305701, South Korea

[3] Hannam Univ, Dept Informat & Biomat, Taejon 306791, South Korea

来源：

JOURNAL OF THE KOREAN PHYSICAL SOCIETY | 2009年 / 54卷 / 01期

关键词：

Two-photon absorption; Polymerization; Stereolithography; MICRO-FABRICATION; ABSORPTION; STORAGE;

D O I：

10.3938/jkps.54.215

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

A three-dimensional microstructure with several tens of nanometer resolution can be fabricated using the ultrafast laser-induced two-photon photopolymerizing fabrication technique. In this fabricating technique, SCR-500 (urethane acrylate) and SU-8 (epoxy) are used as two-photon absorbing photopolymerizable resins. SCR-500 has been used widely to fabricate a 3-D microstructure with highly precise details, but its high-aspect-ratio structure is naturally excessively. On the other hand, SU-8 is rigid, so a high-aspect-ratio microstructure can be fabricated with SU-8. In this report, various aspect-ratio microstructures with SCR-500 and SU-8 were fabricated and the viability of the structures was investigated. Also a 70 nm-linewidth nanowire, which connects between two high-aspect-ratio structures, was fabricated.

引用

页码：215 / 219

页数：5

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