Effect of substrate bias voltage on tensile properties of single crystal silicon microstructure fully coated with plasma CVD diamond-like carbon film

被引:13
作者
Zhang, Wenlei [1 ]
Hirai, Yoshikazu [1 ]
Tsuchiya, Toshiyuki [1 ]
Tabata, Osamu [1 ]
机构
[1] Kyoto Univ, Dept Micro Engn, Kyoto 6158540, Japan
关键词
Diamond-like carbon film; Single crystal silicon; Substrate bias voltage; Chemical composition; Tensileproperties; Fracture toughness; FRACTURE-TOUGHNESS; THIN-FILMS; DLC FILMS; MECHANICAL-PROPERTIES; STRENGTH; STRESS; COATINGS; SPECTROSCOPY; RATIOS;
D O I
10.1016/j.apsusc.2018.02.179
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Tensile strength and strength distribution in a microstructure of single crystal silicon (SCS) were improved significantly by coating the surface with a diamond-like carbon (DLC) film. To explore the influence of coating parameters and the mechanism of film fracture, SCS microstructure surfaces (120 x 4 x 5 mu m(3)) were fully coated by plasma enhanced chemical vapor deposition (PECVD) of a DLC at five different bias voltages. After the depositions, Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), thermal desorption spectrometry (TDS), surface profilometry, atomic force microscope (AFM) measurement, and nanoindentation methods were used to study the chemical and mechanical properties of the deposited DLC films. Tensile test indicated that the average strength of coated samples was 13.2-29.6% higher than that of the SCS sample, and samples fabricated with a 400 V bias voltage were strongest. The fracture toughness of the DLC film was the dominant factor in the observed tensile strength. Deviations in strength were reduced with increasingly negative bias voltage. The effect of residual stress on the tensile properties is discussed in detail. (C) 2018 Elsevier B.V. All rights reserved.
引用
收藏
页码:48 / 54
页数:7
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