Advanced Colloidal Lithography Beyond Surface Patterning

被引：102

作者：

Ai, Bin ^{[1
]}

Moehwald, Helmuth ^{[2
]}

Wang, Dayang ^{[3
]}

Zhang, Gang ^{[1
]}

机构：

[1] Jilin Univ, Coll Chem, State Key Lab Supramol Struct & Mat, Changchun 130012, Peoples R China

[2] Max Planck Inst Colloids & Interfaces, D-14424 Potsdam, Germany

[3] RMIT Univ, Sch Engn, Dept Civil Environm & Chem Engn, Melbourne, Vic 3001, Australia

来源：

ADVANCED MATERIALS INTERFACES | 2017年 / 4卷 / 01期

基金：

中国国家自然科学基金;

关键词：

SHADOW NANOSPHERE LITHOGRAPHY; ENHANCED RAMAN-SCATTERING; LARGE-AREA; PHOTONIC CRYSTALS; MICRO/NANOSTRUCTURED ARRAYS; CONTROLLED FABRICATION; PLASMON HYBRIDIZATION; NANOCONE ARRAYS; PERIODIC ARRAYS; NANOHOLE ARRAYS;

D O I：

10.1002/admi.201600271

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

This Review presents an overview of recent development of colloidal lithography (CL) and its applications in fabrication of various nanostructures consisted of orderly arranged, dots, holes, bowls, cones, pillars, rings, shells and triangles. These structures have been widely exploited in various fields, including plasmonics, optics, wettability, sensors, solar cells, organic light-emitting diode (OLEDs), biology and many others. The recent successes in the technical applications of the nanostructures fabricated via CL will be summarized. Hopefully, the present review will inspire more ingenious designs and execution of CL for advanced, smart applications.

引用

页数：19

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