Interactive study of straight-sided buckling patterns in thin films under compressive stress

被引：20

作者：

Cleyman, F ^{[1
]}

Coupeau, C ^{[1
]}

Colin, J ^{[1
]}

Grilhe, J ^{[1
]}

机构：

[1] SP2MI, LMP, UMR 6630, F-86960 Futuroscope, France

来源：

EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS | 2000年 / 10卷 / 01期

关键词：

D O I：

10.1051/epjap:2000113

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In situ atomic force microscopy observations have been carried out of thin films under external compressive stress. Straight sided buckling patterns arise perpendicular to the compression axis which tend to attract one another during propagation a few hundred nanometers apart. The mechanisms whereby these debonding patterns interact have been investigated taking into account the elastic energy of both the film and the substrate. The equilibrium distance between two straight-sided wrinkles has been determined; good agreement has been obtained between the experimental results and the mechanics involved.

引用

页码：3 / 7

页数：5

共 24 条

[1]

[Anonymous], PHYS REV LETT

[2] ONE DIMENSIONAL MODELING OF FAILURE IN LAMINATED PLATES BY DELAMINATION BUCKLING [J].