Cut-through metal slit array as an anisotropic metamaterial film

被引:48
|
作者
Shin, Jonghwa [1 ]
Shen, Jung-Tsung [1 ]
Catrysse, Peter B. [1 ]
Fan, Shanhui [1 ]
机构
[1] Stanford Univ, Edward L Ginzton Lab, Stanford, CA 94305 USA
基金
美国国家科学基金会;
关键词
anisotropic material; metal slit; optical metamaterial; subwavelength resonance;
D O I
10.1109/JSTQE.2006.879577
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
It has been shown that a metal film with a one-dimensional array of subwavelength cut-through slits can be accurately modeled as an anisotropic and uniform metamaterial film with nondispersive electric permittivity [(epsilon) over bar] and magnetic permeability [(mu) over bar] tensors. This model has an interesting scaling property: The values for the thickness L can be chosen at arbitrarily, provided that [(epsilon) over bar] and [(mu) over bar] are scaled accordingly. The analytical expressions of the corrections due to near fields have also been given. This framework provides an intuitive and precise model for the understanding of the metal slit arrays in the subwavelength regime.
引用
收藏
页码:1116 / 1122
页数:7
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