Photobase Generators Liberating Two Bases by Absorbing One Photon and Their Application to Photosensitive Materials

被引：9

作者：

Arimitsu, Koji ^{[1
]}

Maruyama, Yuya ^{[1
]}

Furutani, Masahiro ^{[1
]}

机构：

[1] Tokyo Univ Sci, Fac Sci & Technol, Dept Pure & Appl Chem, Noda, Chiba 2788510, Japan

来源：

CHEMISTRY LETTERS | 2015年 / 44卷 / 09期

关键词：

FTIR-ATR SPECTROSCOPY; PHOTOCHEMICAL GENERATION; PHOTOREACTIVE MATERIALS; BENZOIN DERIVATIVES; SUPERBASES; PHOTOGENERATION; LIGHT; ACID;

D O I：

10.1246/cl.150405

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We propose a photobase generator (PBG) that liberates two bases by absorbing one photon. Phototriggered decarboxylation proceeds first to generate one base, and subsequently the unstable reaction intermediate is thermally decarboxylated to generate another base. It was found that the photosensitivity of poly(glycidyl methacrylate) films containing the PBG is much higher than that of films containing a conventional PBG that generates one base by absorbing one photon.

引用

页码：1194 / 1196

页数：3

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