X-ray micro beam analysis of the photoresponse of an enlarged CVD diamond single crystal

被引:5
作者
De Sio, A. [1 ]
Di Fraia, M. [4 ]
Antonelli, M. [5 ]
Menk, R. H. [3 ]
Cautero, G. [3 ]
Carrato, S. [5 ]
Tozzetti, L. [1 ]
Achard, J. [2 ]
Tallaire, A. [2 ]
Sussmann, R. S.
Pace, E. [1 ]
机构
[1] Univ Florence, Dept Phys & Astron, I-50125 Florence, Italy
[2] Univ Paris 13, Sorbonne Paris Cite, CNRS, F-93430 Villetaneuse, France
[3] ELETTRA Synchrotron, I-34149 Basovizza Trieste, Italy
[4] Univ Trieste, Dept Phys, I-34127 Trieste, Italy
[5] Univ Trieste, Dept Engn & Architecture, I-34127 Trieste, Italy
关键词
Single crystal diamond; Diamond growth; Diamond X-ray detectors; Photoconduction properties; Enlarged diamond; GROWTH;
D O I
10.1016/j.diamond.2013.01.011
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Diamond is one of the most promising materials for developing innovative electronic devices. Chemical vapour deposition (CVD) homoepitaxial growth allows the synthesis of high quality single crystal diamond plates. However, the use of these crystals for electronic applications is hampered by their small area (typically of the order of 10 mm(2)). Large areas are desired to ensure efficient particle or radiation detection with pixelated devices. By growing a thick CVD layer it is possible to enlarge the initial area of the substrate by a factor of 2 since growth also occurs laterally from the substrate. In this work, by using an X-ray collimated synchrotron radiation beam, the detection and charge collection properties of an enlarged CVD single-crystal diamond are used as a point-to-point probe to study the material quality. It was found that stress and dislocation density are correlated with the detection properties of the enlarged regions. The sensitivity of the device is affected by the vertical-to-lateral growth interface and the enlarged material quality seems to be correlated with the distance from this interface. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:36 / 40
页数:5
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