Interstitial faulted dislocation dipole formation in sapphire (α-Al2O3)

被引:2
作者
Lagerloef, K. P. D. [1 ]
Castaing, J. [1 ,2 ]
Heuer, A. H. [1 ]
机构
[1] Case Western Reserve Univ, Dept Mat Sci & Engn, Cleveland, OH 44106 USA
[2] CNRS UMR 171, Ctr Rech & Restaurat Musees France, F-75001 Paris, France
关键词
sapphire; dislocation dipole; interstitial point defect; deformation; BASAL SLIP; DISSOCIATION; ENERGETICS; MODEL;
D O I
10.1080/14786435.2012.702231
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
While both vacancy and interstitial edge-trapped perfect dislocation dipoles form with equal probability during high temperature basal deformation of sapphire, faulted dipoles are invariably interstitial in character. The most likely origin of this asymmetry is the different energy associated with the point defects needed to be ejected into the bulk crystal for a dipole to be annihilated. Interstitial point defects are much more energetic than vacancy defects, leading to immediate supersaturation, and rapid condensation of the interstitials into a faulted dipole segment, rather than being absorbed by the bulk crystal.
引用
收藏
页码:152 / 161
页数:10
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