The reactivity of ozone incident onto the surface of perovskite thin films grown by MBE

被引：0

作者：

Theis, CD

Schlom, DG

机构：

来源：

PROCEEDINGS OF THE NINTH INTERNATIONAL CONFERENCE ON HIGH TEMPERATURE MATERIALS CHEMISTRY | 1997年 / 97卷 / 39期

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D O I：

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中图分类号：

O69 [应用化学];

学科分类号：

081704 ;

摘要：

Methods for measuring key parameters in the growth of oxide film by MBE have been established. Using a directed gas inlet nozzle to supply ozone to the surface of the depositing film, we have determined the ozone partial pressure (or rate of incidence) at the substrate surface. Additionally, the purity of ozone reaching the substrate, as well as the sticking coefficient or reactivity of ozone with various constituent elements are given.

引用

页码：610 / 616

页数：7