Low contact resistance in epitaxial graphene devices for quantum metrology

被引:18
|
作者
Yager, Tom [1 ]
Lartsev, Arseniy [1 ]
Cedergren, Karin [2 ]
Yakimova, Rositsa [3 ]
Panchal, Vishal [4 ]
Kazakova, Olga [4 ]
Tzalenchuk, Alexander [4 ,5 ]
Kim, Kyung Ho [6 ]
Park, Yung Woo [6 ]
Lara-Avila, Samuel [1 ]
Kubatkin, Sergey [1 ]
机构
[1] Chalmers Univ Technol, Dept Microtechnol & Nanosci, S-41296 Gothenburg, Sweden
[2] Univ New S Wales, Sch Phys, Sydney, NSW 2052, Australia
[3] Linkoping Univ, Dept Phys Chem & Biol IFM, S-58183 Linkoping, Sweden
[4] Natl Phys Lab, Teddington TW11 0LW, Middx, England
[5] Univ London, Dept Phys, Egham TW20 0EX, Surrey, England
[6] Seoul Natl Univ, Dept Phys & Astron, Seoul 151747, South Korea
来源
AIP ADVANCES | 2015年 / 5卷 / 08期
关键词
All Open Access; Gold;
D O I
10.1063/1.4928653
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We investigate Ti/Au contacts to monolayer epitaxial graphene on SiC (0001) for applications in quantum resistance metrology. Using three-terminal measurements in the quantum Hall regime we observed variations in contact resistances ranging from a minimal value of 0.6 Omega up to 11 k Omega. We identify a major source of high-resistance contacts to be due bilayer graphene interruptions to the quantum Hall current, whilst discarding the effects of interface cleanliness and contact geometry for our fabricated devices. Moreover, we experimentally demonstrate methods to improve the reproducibility of low resistance contacts (< 10 Omega) suitable for high precision quantum resistance metrology. (C) 2015 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.
引用
收藏
页数:7
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