A Mask Quality Control tool for the OSIRIS Multi Object Spectrograph

被引：1

作者：

Lopez-Ruiz, J. C. ^{[1
,2
]}

Vaz Cedillo, Jacinto Javier ^{[1
]}

Ederoclite, Alessandro ^{[3
]}

Bongiovanni, Angel ^{[1
,2
]}

Gonzalez Escalera, Victor ^{[1
]}

机构：

[1] Inst Astrofis Canarias, Tenerife, Spain

[2] Univ la Laguna, E-38207 San Cristobal de la Laguna, Spain

[3] Ctr Estudios Fis Cosmos Aragon, San Cristobal la Laguna, Spain

来源：

SOFTWARE AND CYBERINFRASTRUCTURE FOR ASTRONOMY II | 2012年 / 8451卷

关键词：

quality control; MOS; metrology; visual inspection; mask quality observation; mask quality manufacturing;

D O I：

10.1117/12.925682

中图分类号：

P1 [天文学];

学科分类号：

0704 ;

摘要：

OSIRIS multi object spectrograph uses a set of user-customised-masks, which are manufactured on-demand. The manufacturing process consists of drilling the specified slits on the mask with the required accuracy. Ensuring that slits are on the right place when observing is of vital importance. We present a tool for checking the quality of the process of manufacturing the masks which is based on analyzing the instrument images obtained with the manufactured masks on place. The tool extracts the slit information from these images, relates specifications with the extracted slit information, and finally communicates to the operator if the manufactured mask fulfills the expectations of the mask designer. The proposed tool has been built using scripting languages and using standard libraries such as opencv, pyraf and scipy. The software architecture, advantages and limits of this tool in the lifecycle of a multiobject acquisition are presented.

引用

页数：13

共 3 条

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