Investigation of the conditions required for the formation of a magnetic neutral loop discharge plasma

被引:16
|
作者
Sakoda, T
Okraku-Yirenkyi, Y
Sung, YM
Otsubo, M
Honda, C
机构
[1] Sojo Univ, Dept Elect Engn, Kumamoto 8600082, Japan
[2] Miyazaki Univ, Dept Elect Elect Engn, Miyazaki 8892192, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2001年 / 40卷 / 11期
关键词
processing plasma; neutral loop discharge; laser induced fluorescence; optical emission spectroscopy; electron behavior;
D O I
10.1143/JJAP.40.6607
中图分类号
O59 [应用物理学];
学科分类号
摘要
In order to reveal the conditions required for the formation of a neutral loop discharge (NLD) plasma, distributions of excited atoms that are closely related to the distributions of the ionization rates were measured under various discharge conditions. Measurements of the distributions of these excited atoms were performed by laser induced fluorescence spectroscopy and optical emission spectroscopy. It was found that the results of these measurements were consistent with the theoretically predicted dependencies of electron heating on the magnetic field strength, the radio frequency (RF) electric field. and the frequency of the RIF source. In addition, it was shown that the effects of electron-neutral collisions and of the finite size of the device set limitations on the formation of the NLD plasma.
引用
收藏
页码:6607 / 6612
页数:6
相关论文
共 50 条
  • [11] SiO2 etching in magnetic neutral loop discharge plasma
    J Vac Sci Technol A, 3 pt 2 (1594):
  • [12] SiO2 etching in magnetic neutral loop discharge plasma
    Chen, W
    Itoh, M
    Hayashi, T
    Uchida, T
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (03): : 1594 - 1599
  • [13] Etching characteristics of organic polymers in the magnetic neutral loop discharge plasma
    Morikawa, Y
    Hayashi, T
    Uchida, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (03): : 1441 - 1444
  • [14] Electron Distribution in a Quadrupole Magnetic Field to Drive Magnetic Neutral Loop Discharge Plasma
    Osaga, Tsuyoshi
    Sakurai, Yohei
    Sugawara, Hirotake
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2011, 39 (11) : 2546 - 2547
  • [15] Low-k materials etching in magnetic neutral loop discharge plasma
    Morikawa, Y
    Yasunami, S
    Chen, W
    Hayashi, T
    Uchida, T
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2001, 19 (04): : 1747 - 1751
  • [16] Observation of induction power dependence on the magnetic neutral loop discharge plasma thermalization phenomena
    Tsuboi, H
    Hayashi, T
    Uchida, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (10): : 6540 - 6544
  • [17] Observation of characteristics of magnetic neutral loop discharge plasma appearing at antenna in RF circuit
    Tsuboi, Hideo
    Ogata, Seiji
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2007, 46 (11): : 7475 - 7477
  • [18] Observation of characteristics of magnetic neutral loop discharge plasma appearing at antenna in RF circuit
    Tsuboi, Hideo
    Ogata, Seiji
    1600, Japan Society of Applied Physics, 1-12-3 Kudan-Kita,k Chiyoda-ku, Tokyo, 102, Japan (46):
  • [19] A Novel Scallop Free TSV Etching Method In Magnetic Neutral Loop Discharge Plasma
    Morikawa, Yasuhiro
    Murayama, Takahide
    Sakuishi, Toshiyuki
    Yoshii, Manabu
    Suu, Koukou
    2012 IEEE 62ND ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE (ECTC), 2012, : 794 - 795
  • [20] Observation of induction power dependence on the magnetic neutral loop discharge plasma thermalization phenomena
    ULVAC Japan, Ltd, Kanagawa, Japan
    Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, 10 (6540-6544):