SiC and GaN wide bandgap semiconductor materials and devices

被引:74
作者
Burk, AA [1 ]
O'Loughlin, MJ
Siergiej, RR
Agarwal, AK
Sriram, S
Clarke, RC
MacMillan, MF
Balakrishna, V
Brandt, CD
机构
[1] Northrop Grumman ESSD Adv Technol Lab, Baltimore, MD 21203 USA
[2] Northrop Grumman ESSD Sci & Technol Ctr, Pittsburgh, PA 15235 USA
关键词
D O I
10.1016/S0038-1101(99)00089-1
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Wide bandgap semiconducting materials are promising candidates for high-power, high-temperature, microwave and optoelectronic devices because of their superior thermal and electrical properties in comparison to conventional semiconductors. Recent developments in SIC and GaN materials and processing have enabled the demonstration of semiconductor devices with dramatically improved performance. Examples of these developments and new wide bandgap devices are presented. (C) 1999 Published by Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:1459 / 1464
页数:6
相关论文
共 29 条
  • [1] AGARWAL AK, 1998, IN PRESS DIAMOND REL
  • [2] Burk AA, 1997, PHYS STATUS SOLIDI B, V202, P263, DOI 10.1002/1521-3951(199707)202:1<263::AID-PSSB263>3.0.CO
  • [3] 2-Y
  • [4] SiC epitaxial layer growth in a novel multi-wafer VPE reactor
    Burk, AA
    O'Loughlin, MJ
    Mani, SS
    [J]. SILICON CARBIDE, III-NITRIDES AND RELATED MATERIALS, PTS 1 AND 2, 1998, 264-2 : 83 - 88
  • [5] A NEW VERSATILE, LARGE SIZE MOVPE REACTOR
    FRIJLINK, PM
    [J]. JOURNAL OF CRYSTAL GROWTH, 1988, 93 (1-4) : 207 - 215
  • [6] NITROGEN-IMPLANTED SIC DIODES USING HIGH-TEMPERATURE IMPLANTATION
    GHEZZO, M
    BROWN, DM
    DOWNEY, E
    KRETCHMER, J
    HENNESSY, W
    POLLA, DL
    BAKHRU, H
    [J]. IEEE ELECTRON DEVICE LETTERS, 1992, 13 (12) : 639 - 641
  • [7] JOHNSON EO, 1965, RCA REV, V26, P163
  • [8] CHEMICAL VAPOR-DEPOSITION AND CHARACTERIZATION OF UNDOPED AND NITROGEN-DOPED SINGLE CRYSTALLINE 6H-SIC
    KARMANN, S
    SUTTROP, W
    SCHONER, A
    SCHADT, M
    HABERSTROH, C
    ENGELBRECHT, F
    HELBIG, R
    PENSL, G
    STEIN, RA
    LEIBENZEDER, S
    [J]. JOURNAL OF APPLIED PHYSICS, 1992, 72 (11) : 5437 - 5442
  • [9] Khan MA, 1996, IEEE ELECTR DEVICE L, V17, P584, DOI 10.1109/55.545778
  • [10] KONG HS, 1991, Patent No. 5011549