Ultrasonic-assisted anodic oxidation of 4H-SiC (0001) surface

被引:33
作者
Yang, Xiaozhe [1 ]
Yang, Xu [1 ]
Kawai, Kentaro [1 ]
Arima, Kenta [1 ]
Yamamura, Kazuya [1 ]
机构
[1] Osaka Univ, Div Precis Sci & Technol & Appl Phys, Grad Sch Engn, 2-1 Yamadaoka, Suita, Osaka 5650871, Japan
关键词
Silicon carbide; Ultrasonic-assisted electrochemical mechanical polishing; Ultrasonic-assisted anodic oxidation; Ultrasonic vibration; MECHANISM;
D O I
10.1016/j.elecom.2019.01.012
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
An ultrasonic-assisted electrochemical mechanical polishing (UAECMP) technique that combines ultrasonic vibration and electrochemical mechanical polishing (ECMP) is proposed. The effect of ultrasonic vibration on the anodic oxidation rate of a 4H-SiC (0001) surface was studied, and it was confirmed that ultrasonic vibration significantly enhanced the anodic oxidation of SiC. Compared with conventional anodic oxidation, the oxidation rate increased by about 34% with ultrasonic assistance (UA) in the initial oxidation stage, and by about 11% during subsequent anodic oxidation. In addition, the oxidation can be promoted continuously with increasing oxidation time owing to the porous structure of the oxide layer. UAECMP is very promising as an efficient finishing technique for SiC surfaces.
引用
收藏
页码:1 / 5
页数:5
相关论文
共 28 条
  • [2] Electropolishing of n-type 3C-polycrystalline silicon carbide
    Ballarin, N.
    Carraro, C.
    Maboudian, R.
    Magagnin, L.
    [J]. ELECTROCHEMISTRY COMMUNICATIONS, 2014, 40 : 17 - 19
  • [3] Electro-chemical mechanical polishing of single-crystal SiC using CeO2 slurry
    Deng, Hui
    Hosoya, Kenji
    Imanishi, Yusuke
    Endo, Katsuyoshi
    Yamamura, Kazuya
    [J]. ELECTROCHEMISTRY COMMUNICATIONS, 2015, 52 : 5 - 8
  • [4] CHEMICAL EFFECTS OF ULTRASONICS - HOT SPOT CHEMISTRY
    FITZGERALD, ME
    GRIFFING, V
    SULLIVAN, J
    [J]. JOURNAL OF CHEMICAL PHYSICS, 1956, 25 (05) : 926 - 933
  • [6] Electron-hole pair generation in SiC high-temperature alpha particle detectors
    Garcia, Timothy R.
    Kumar, Ashutosh
    Reinke, Benjamin
    Blue, Thomas E.
    Windl, Wolfgang
    [J]. APPLIED PHYSICS LETTERS, 2013, 103 (15)
  • [7] Surface treatment of silicon carbide using TiO2(IV) photocatalyst
    Ishikawa, Y
    Matsumoto, Y
    Nishida, Y
    Taniguchi, S
    Watanabe, J
    [J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2003, 125 (21) : 6558 - 6562
  • [8] Kentish S, 2011, FOOD ENG SER, P1, DOI 10.1007/978-1-4419-7472-3_1
  • [9] Electro-chemical mechanical polishing of silicon carbide
    Li, CH
    Bhat, IB
    Wang, RJ
    Seiler, J
    [J]. JOURNAL OF ELECTRONIC MATERIALS, 2004, 33 (05) : 481 - 486
  • [10] Production of electricity and hydrogen by photocatalytic degradation of organic wastes in a photoelectrochemical cell The concept of the Photofuelcell: A review of a re-emerging research field
    Lianos, Panagiotis
    [J]. JOURNAL OF HAZARDOUS MATERIALS, 2011, 185 (2-3) : 575 - 590