Atomically precise impurity identification and modification on the manganese doped GaAs(110) surface with scanning tunneling microscopy

被引:36
作者
Garleff, J. K. [1 ]
Celebi, C. [1 ]
Van Roy, W. [2 ]
Tang, J. -M. [3 ]
Flatte, M. E. [4 ,5 ]
Koenraad, P. M. [1 ]
机构
[1] Eindhoven Univ Technol, COBRA Inter Univ, Res Inst, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands
[2] IMEC, B-3001 Louvain, Belgium
[3] Univ New Hampshire, Dept Phys, Durham, NH 03824 USA
[4] Univ Iowa, Dept Phys & Astron, Iowa City, IA 52242 USA
[5] Univ Iowa, Opt Sci & Technol Ctr, Iowa City, IA 52242 USA
来源
PHYSICAL REVIEW B | 2008年 / 78卷 / 07期
关键词
D O I
10.1103/PhysRevB.78.075313
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Cross-sectional scanning tunneling microscopy (STM) measurements on molecular beam epitaxy grown Mn doped GaAs(110) at 5 and 77 K are presented. The enhanced mechanical stability of the STM at low temperature allows a detailed study of the electronic contrast of Mn atoms in the GaAs(110) surface. According to reproducible and distinguishable contrast patterns of single Mn atoms, we present statistical evidence for a layer by layer identification of Mn atoms embedded in the first few monatomic layers of the crystal. A comparison with a bulklike theoretical approach reveals a semiquantitative agreement with the measurements. Remaining differences between theory and experiment indicate the influence of the surface as an important factor to understand the contrast of impurities close to the surface. Furthermore, we report the injection of transition-metal atoms into the surface. Finally, reproducible complexes consisting of a surface Mn and an adsorbate atom are found and manipulated.
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页数:8
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