Dependence of ZnO:Al properties on the substrate to target position in RF sputtering

被引:18
作者
Couzinie-Devy, F. [1 ]
Barreau, N. [1 ]
Kessler, J. [1 ]
机构
[1] Univ Nantes, LAMP, F-44322 Nantes 3, France
关键词
thin films; ZnO; solar cells;
D O I
10.1016/j.tsf.2007.12.053
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Al doped ZnO (ZnO:Al) is commonly used as front contact in Cu(In,Ga)Se-2 based thin film solar cells, and for this application is often deposited by RF magnetron sputtering from a ceramic target. In the present study, we use a configuration in which the substrates are immobile under the sputter target and we find the ZnO:Al film properties to depend strongly on the substrate position relative to the target erosion area (or "racetrack"). The zone immediately under the racetrack has higher resistivity correlated to a lesser crystallinity. The differences between these zones (inside the racetrack, under the racetrack, outside the racetrack) are studied as a function of the substrate: bare soda-lime glass (SLG), (CBD)CdS coated SLG, undoped ZnO coated SLG. It is shown that the evolution of the ZnO:Al films non homogeneity is substrate dependent. The impact on complete CIGSe/CdS/ZnO/ZnO:Al devices is measured and show that the influence of the substrates has to be taking in account; the device prediction made from models using the ZnO:Al properties measured on bare glass are inaccurate. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:7094 / 7097
页数:4
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