Effect of chemical stress on diffusion in a hollow cylinder

The effect of chemical stress on diffusion in a hollow cylinder for plane strain and zero axial force has been investigated. Two diffusion processes of constant surface stress and constant surface potential are studied. No matter what the plane strain or zero axial force is the influence of chemical stress on the diffusion process of constant surface potential is similar to that of constant surface stress. Chemical stress enhances both the diffusion coefficient and the concentration. For a given time, the level of concentration becomes lower with a greater ratio of outer radius to inner radius for constant surface potential with given FXf and for constant surface stress with given FXi. F = 2 E(V) over bar/[9(1 - upsilon)RT] where E, (V) over bar, R, and T are the Young's modulus, partial molal volume, gas constant, and absolute temperature, respectively; X-i and X-f are the initial and final mole fractions at boundary surfaces. The results are also compared with those in thin plates and solid cylinders reported in the literature. (C) 2002 American Institute of Physics.